Performance Investigation of an n-Type Tin-Oxide Thin Film Transistor by Channel Plasma Processing
IEEE Journal of the Electron Devices Society,2168-6734,2020.
Shang, Z. W.; Ma, J.; Liu, W. D.; Fan, Y. C.; Hsu, H. H.; Zheng, Z. W.; Cheng, C. H.
WOS:000536054900005
EI:20202108696352
10.1109/JEDS.2020.2986172
收录情况:SCIE、EI