已发表成果:
WOK 论文 259 篇;中文核心 78 篇;其它论文 27 篇;专利发明 20 个;
Spatially modulated femtosecond laser direct ablation-based preparation of ultra-flexible multifunctional copper mesh electrodes and its application
Secondary Epitaxy of High Sn Fraction Gesn Layer on Annealing-Induced Strain Relaxation Gesn Virtue Substrate by Low Temperature Molecular Beam Epitaxy
Enhanced photoluminescence of GeSn by strain relaxation and spontaneous carrier confinement through rapid thermal annealing
Blocking of Ge/Si lattice mismatch and fabrication of high-quality SOI-based Ge film by interlayer wafer bonding with polycrystalline Ge bonding layer
The Transition of Growth Behaviors of Moderate Sn Fraction Ge1-Xsnx (8%<X<15%) Epilayers with Low Temperature Molecular Beam Epitaxy
Fabrication of ordered arrays of GeSn nanodots using anodic aluminum oxide as a template
Thickness-dependent behavior of strain relaxation and Sn segregation of GeSn epilayer during rapid thermal annealing
Interfacial nitrogen engineering of robust silicon/MXene anode toward high energy solid-state lithium-ion batteries
Controllable synthesis of Si-based GeSn quantum dots with room-temperature photoluminescence
Theoretical Achievement of THz Gain-Bandwidth Product of Wafer-Bonded InGaAs/Si Avalanche Photodiodes With Poly-Si Bonding Layer
Liquid-phase sintering enabling mixed ionic-electronic interphases and free-standing composite cathode architecture toward high energy solid-state battery
Tuning the electron transport behavior at Li/LATP interface for enhanced cyclability of solid-state Li batteries
High gain, broadband p-WSe2/n-Ge van der Waals heterojunction phototransistor with a Schottky barrier collector
高质量半导体复合薄膜材料制备
第六届粤港澳真空科技创新发展论坛暨先进微纳制造技术与前沿应用高峰论坛论文集,,2022-09-22.Au纳米颗粒结构参数优化制备高性能纳米晶存储器
半导体技术,1003-353X,2022-05-31.