学者信息

时康 (Kang Shi)

化学化工学院

ResearcherID:G-3406-2010

合作者

已发表成果:

WOK 论文 36 篇;中文核心 8 篇;其它论文 3 篇;专利发明 6 个;

  • Interfacial Reactions and Smooth Etching Strategy of n-type Gallium Nitride Photoanodes

    Journal of the Electrochemical Society,0013-4651,2020-12.
    Hu, Huiqing; Guo, Sai; Wang, Yahui; Shi, Kang
    WOS:000617414400001   EI:20210309768708   10.1149/1945-7111/abd2db
    收录情况:SCIE、EI
  • Polishing tool with phyllotactic distributed through-holes for photochemically combined mechanical polishing of N-type gallium nitride wafers

    Precision Engineering,0141-6359,2020-11.
    Ou, Liwei; Guo, Sai; Zhe, Yan; Dong, Zhigang; Kang, Renke; Guo, Dongming; Shi, Kang
    WOS:000583295900013   EI:20203209030042   10.1016/j.precisioneng.2020.06.009
    收录情况:SCIE、EI
  • Investigation on the gallium nitride polishing process under hybrid-field effects

    China Semiconductor Technology International Conference 2020, CSTIC 2020,,2020-06-26.
    Dong, Zhigang (1); Ou, Liwei (1); Shi, Kang (2); Kang, Renke (1); Guo, Dongming (1)
    EI:20210309773836   10.1109/CSTIC49141.2020.9282459
    收录情况:EI
  • 面向半导体器件的电化学微纳制造技术

    厦门大学学报(自然科学版),0438-0479,2020-09-28.
    韩联欢;杜炳谦;许瀚涛;时康;周剑章;杨防祖;詹东平;田昭武
    CSCD核心