已发表成果:
WOK 论文 14 篇;中文核心 3 篇;其它论文 1 篇;专利发明 4 个;
Large-area homogeneous corrosion process for electrochemical nanoimprint lithography on GaAs wafer by modulating contact pressure
Spatially-separated and photo-enhanced semiconductor corrosion processes for high-efficient and contamination-free electrochemical nanoimprint lithography