学者信息
已发表成果：
WOK 论文 24 篇;中文核心 3 篇;其它论文 1 篇;
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Schottky barrier height modulation effect on n-Ge with TaN contact
Materials Science in Semiconductor Processing,1369-8001,2019-03-01.
Wang, Jianyuan (1); Huang, Wei (1); Xu, Jianfang (1); Li, Jun (1); Huang, Shihao (2); Li, Cheng (1)...
WOS:000454537700029 EI:20184806166844 10.1016/j.mssp.2018.11.016
收录情况：SCIE、EI